发明授权
US07230202B2 Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
有权
等离子体处理装置，电极单元，馈线构件和射频馈线棒
- 专利标题： Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
- 专利标题（中）： 等离子体处理装置，电极单元，馈线构件和射频馈线棒
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申请号： US10927587申请日： 2004-08-27
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公开(公告)号： US07230202B2公开(公告)日： 2007-06-12
- 发明人: Daisuke Hayashi , Kazuya Nagaseki , Shinji Himori , Atsushi Matsuura , Ryo Nonaka
- 申请人： Daisuke Hayashi , Kazuya Nagaseki , Shinji Himori , Atsushi Matsuura , Ryo Nonaka
- 申请人地址： JP Tokyo-To
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo-To
- 代理机构： Smith, Gambrell & Russell, LLP
- 主分类号： B23K9/00
- IPC分类号： B23K9/00
摘要：
Disclosed herein is a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a plasma process to an object to be processed arranged in the processing container. The plasma processing apparatus includes: an electrode unit arranged in the processing container, the electrode unit having an electrode for applying the radio frequency power, and a space portion arranged in the electrode unit, the space portion insulating the electrode and the processing container from each other. The space portion communicates with atmospheric air outside the processing container.
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