发明授权
- 专利标题： Electron beam lens for micro-column electron beam apparatus and method of fabricating the same
- 专利标题（中）： 用于微柱电子束装置的电子束透镜及其制造方法
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申请号： US11174891申请日： 2005-07-01
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公开(公告)号： US07230251B2公开(公告)日： 2007-06-12
- 发明人: Sang Kuk Choi , Dae Yong Kim
- 申请人： Sang Kuk Choi , Dae Yong Kim
- 申请人地址： KR
- 专利权人： Electronics and Telecommunications Research Institute
- 当前专利权人： Electronics and Telecommunications Research Institute
- 当前专利权人地址： KR
- 代理机构： Blakely Sokoloff Taylor & Zafman
- 优先权： KR2003-74927 20031025
- 主分类号： H01J37/12
- IPC分类号： H01J37/12
摘要：
Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.
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