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16 条记录 (耗时 0.031 秒)

    Micro stage using piezoelectric element
    1.
    发明授权
    Micro stage using piezoelectric element 有权
    微电极采用压电元件

    公开(公告)号：US07732985B2

    公开(公告)日：2010-06-08

    申请号：US11231471

    申请日：2005-09-20

    申请人： Sang Kuk Choi ,  Dae Jun Kim ,  Jin Woo Jeong ,  Dae Yong Kim

    发明人： Sang Kuk Choi ,  Dae Jun Kim ,  Jin Woo Jeong ,  Dae Yong Kim

    IPC分类号： H01L41/00

    CPC分类号： H02N2/028 ,  H01J2237/20264

    摘要： Provided is a micro stage comprising: a body having a vertically perforated through-hole passing through a central portion thereof; a bobbin including a tip portion with an electron emission tip embedded in the center thereof, and passing through the through-hole of the body to be moved in the through-hole along a first axis perpendicular to a vertical direction; a first piezoelectric element disposed on the body and lengthened when a voltage is applied thereto to push the bobbin in one direction along the first axis; a second piezoelectric element disposed on the body and lengthened when a voltage is applied thereto to push the bobbin in the other direction along the first axis; and an upper cover that is coupled to an upper portion of the body and has a through-hole, through which the bobbin passes and communicates with the through-hole of the body, wherein the bobbin can be positioned as desired along the first axis by adjusting the voltages applied to the first piezoelectric element and the second piezoelectric element. Accordingly, the emission tip can be exactly and stably positioned using only the movable piezoelectric elements.

    摘要翻译： 提供了一种微型台，包括：主体，其具有穿过其中心部分的垂直穿孔的通孔; 线轴，其包括具有嵌入其中心的电子发射尖端的尖端部分，并沿着垂直于垂直方向的第一轴线穿过所述通孔的待通孔; 第一压电元件，其设置在所述主体上，并且当施加电压时被延长以沿着所述第一轴线沿一个方向推动所述线轴; 第二压电元件，其设置在所述主体上并且当施加电压时被延长以沿着所述第一轴线沿另一方向推动所述线轴; 以及上盖，其联接到所述主体的上部并且具有通孔，所述筒管通过所述通孔，所述通孔与所述主体的所述通孔连通，其中所述线轴可根据需要沿着所述第一轴线由 调整施加到第一压电元件和第二压电元件的电压。 因此，可以仅使用可动压电元件来精确且稳定地定位发射尖端。

    Micro-column electron beam apparatus
    4.
    发明授权
    Micro-column electron beam apparatus 失效
    微柱电子束装置

    公开(公告)号：US07375351B2

    公开(公告)日：2008-05-20

    申请号：US11257244

    申请日：2005-10-24

    申请人： Sang Kuk Choi ,  Dae Jun Kim ,  Jin Woo Jeong ,  Dae Yong Kim

    发明人： Sang Kuk Choi ,  Dae Jun Kim ,  Jin Woo Jeong ,  Dae Yong Kim

    IPC分类号： G21G5/00

    CPC分类号： H01J37/067 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1502 ,  H01J2237/2818

    摘要： Provided is a micro-column electron beam apparatus including: a base; an electron lens bracket on which an electron lens module can be fixed, mounted in a central portion of the base; an electron beam source tip module vertically disposed on the electron lens module; a pan spring plate stage module that is mounted over the base, supports the electron beam source tip module at a central portion thereof, and includes a three-coupling pan spring plate portion including first through third spring units that are coupled to the electron beam source tip module in three directions on a plane perpendicular to the vertical axis, which vertically passes the center of the electron beam source tip module, to elastically support the electron beam source tip module in three directions; a first piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a first axis perpendicular to the vertical axis; and a second piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a second axis perpendicular to the vertical axis and the first axis.

    摘要翻译： 本发明提供一种微柱电子束装置，包括：基底; 电子透镜支架，其上可以固定电子透镜模块，安装在基座的中心部分; 垂直设置在电子透镜模块上的电子束源头模块; 安装在基座上方的平板弹簧板台模块在其中心部分处支撑电子束源头模块，并且包括三联盘盘弹簧板部分，其包括耦合到电子束源的第一至第三弹簧单元 尖端模块在垂直于垂直轴线的平面上垂直通过电子束源头模块的中心，在三个方向弹性支撑电子束源头模块; 第一压电致动器，其联接到所述盘簧板模块以沿着垂直于所述垂直轴线的第一轴线移动所述电子束源尖端模块; 以及耦合到盘簧级模块的第二压电致动器，用于沿垂直于垂直轴线和第一轴线的第二轴线移动电子束源尖端模块。

    Deflector of a micro-column electron beam apparatus and method for fabricating the same
    6.
    发明授权
    Deflector of a micro-column electron beam apparatus and method for fabricating the same 失效

    公开(公告)号：US06797963B2

    公开(公告)日：2004-09-28

    申请号：US10617703

    申请日：2003-07-14

    申请人： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

    发明人： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

    IPC分类号： H01J4942

    CPC分类号： H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

    摘要： The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.

    Deflector of a micro-column electron beam apparatus and method for fabricating the same
    9.
    发明授权
    Deflector of a micro-column electron beam apparatus and method for fabricating the same 有权
    微柱电子束装置的偏转器及其制造方法

    公开(公告)号：US07214117B2

    公开(公告)日：2007-05-08

    申请号：US10853519

    申请日：2004-05-26

    申请人： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

    发明人： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

    IPC分类号： H01L21/00

    CPC分类号： H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

    摘要： The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.

    摘要翻译： 微柱电子束装置的偏转器及其制造方法技术领域本发明涉及一种微柱电子束装置的偏转器及其制造方法，其在基板的两面形成种子金属层和掩模层，并使一些种子金属层露出偏转 板，布线和焊盘将通过使用预定掩模的光刻工艺形成。 布线和焊盘通过在暴露部分上电镀金属而形成，并且一些金属层也暴露在其上将使用预定掩模在其上形成偏转板，然后以期望的厚度镀覆金属，由此偏转 板块完成。 因此，通过电镀处理同时在基板的两面形成多个偏转板，可以精确地形成形成在基板两侧的偏转板之间的对准，并且通过制造与基板一体化的偏转板和偏转 分批处理板，提高了生产率和再现性。 此外，由于偏转板，布线和焊盘直接形成在基板上，所以结构安全性得到改善，从而也提高了耐久性。