Invention Grant
- Patent Title: Grain growth inhibitor for superfine materials
- Patent Title (中): 超细材料颗粒生长抑制剂
-
Application No.: US10405450Application Date: 2003-04-02
-
Publication No.: US07238219B2Publication Date: 2007-07-03
- Inventor: Danny T. Xiao , Chris W. Strock , Donald M. Wang , Peter R. Strutt
- Applicant: Danny T. Xiao , Chris W. Strock , Donald M. Wang , Peter R. Strutt
- Applicant Address: US CT North Haven
- Assignee: Inframat Corporation
- Current Assignee: Inframat Corporation
- Current Assignee Address: US CT North Haven
- Agency: Cantor Colburn LLP
- Main IPC: B22F1/00
- IPC: B22F1/00 ; B22F1/02

Abstract:
A superfine material made by incorporation of an inorganic polymer precursor of a grain growth inhibitor into intermediates useful for the production of superfine materials. The precursor/nanostructured material composite is optionally heat treated at a temperature below the grain growth temperature of the superfine material in order to more effectively disperse the precursor. The composites are then heat treated at a temperature effective to decompose the precursor and to form superfine materials having grain growth inhibitors uniformly distributed at the grain boundaries. Synthesis of the inorganic polymer solution comprises forming an inorganic polymer from a solution of metal salts, filtering the polymer, and drying. Alloying additives as well as grain growth inhibitors may be incorporated into the superfine materials.
Public/Granted literature
- US20050081680A1 GRAIN GROWTH INHIBITOR FOR SUPERFINE MATERIALS Public/Granted day:2005-04-21
Information query