Invention Grant
- Patent Title: X-ray optical system with adjustable convergence
- Patent Title (中): 具有可调收敛的X射线光学系统
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Application No.: US10787516Application Date: 2004-02-26
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Publication No.: US07245699B2Publication Date: 2007-07-17
- Inventor: Boris Verman , Licai Jiang
- Applicant: Boris Verman , Licai Jiang
- Applicant Address: US MI Auburn Hills
- Assignee: Osmic, Inc.
- Current Assignee: Osmic, Inc.
- Current Assignee Address: US MI Auburn Hills
- Agency: Brinks Hofer Gilson & Lione
- Main IPC: G21K1/06
- IPC: G21K1/06

Abstract:
An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.
Public/Granted literature
- US20040170250A1 X-ray optical system with adjustable convergence Public/Granted day:2004-09-02
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