发明授权
- 专利标题: Diaphragm structure
- 专利标题(中): 隔膜结构
-
申请号: US11315895申请日: 2005-12-22
-
公开(公告)号: US07247972B2公开(公告)日: 2007-07-24
- 发明人: Tsutomu Nanataki , Kunihiko Yoshioka
- 申请人: Tsutomu Nanataki , Kunihiko Yoshioka
- 申请人地址: JP Nagoya
- 专利权人: NGK Insulators, Ltd.
- 当前专利权人: NGK Insulators, Ltd.
- 当前专利权人地址: JP Nagoya
- 代理机构: Burr & Brown
- 优先权: JP2004-372133 20041222
- 主分类号: H02N2/00
- IPC分类号: H02N2/00 ; H01L41/00 ; B41J2/16
摘要:
There is disclosed a diaphragm structure that includes: a ceramic substrate 3 in which at least one opening 2 is formed, and a thin diaphragm portion 4 having a shape protruding on a side opposite to the opening 2 and constituted of a ceramic fired integrally with the ceramic substrate 3 in such a manner as to cover the opening 2. An opening shape of the opening 2 is a shape including at least one tip portion 5 in a longitudinal direction, having a curved shape, and a tapered portion 6 whose opening width gradually narrows toward the tip portion 5 and which is constituted of a curve or a straight line, and a portion of the diaphragm portion 4 corresponding to the tapered portion 6 has such a shape that a protruding height gradually lowers toward the tip portion 5.
公开/授权文献
- US20060175933A1 Diaphragm structure 公开/授权日:2006-08-10
信息查询