发明授权
- 专利标题: Planarized perpendicular pole tip system and method for manufacturing the same
- 专利标题(中): 平面垂直极端系统及其制造方法
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申请号: US10798163申请日: 2004-03-10
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公开(公告)号: US07248434B2公开(公告)日: 2007-07-24
- 发明人: Frederick Hayes Dill , Jeffrey S. Lille , Son Van Nguyen , Hugo Alberto Emilio Santini
- 申请人: Frederick Hayes Dill , Jeffrey S. Lille , Son Van Nguyen , Hugo Alberto Emilio Santini
- 申请人地址: NL Amsterdam
- 专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址: NL Amsterdam
- 代理机构: Zilka-Kotab, PC
- 主分类号: G11B5/147
- IPC分类号: G11B5/147
摘要:
A method for manufacturing a pole tip structure for a magnetic head is provided. An etch stop layer is initially deposited after which a transfer layer is deposited. Further deposited is at least one masking layer. Reactive ion etching is then performed to define a trench in at least the transfer layer. A pole tip layer is then deposited in the trench to define a pole tip structure flanked at least in part by the transfer layer. A surface of the transfer layer or etch stop layer then remains in co-planar relationship with a surface of the pole tip structure.
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