发明授权
US07253884B2 Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method 失效
光刻设备的校准方法,校准方法,计算机程序,数据存储介质,光刻设备和器件制造方法

Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method
摘要:
In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.
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