发明授权
- 专利标题: Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method
- 专利标题(中): 光刻设备的校准方法,校准方法,计算机程序,数据存储介质,光刻设备和器件制造方法
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申请号: US10845521申请日: 2004-05-14
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公开(公告)号: US07253884B2公开(公告)日: 2007-08-07
- 发明人: Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Alex De Vries
- 申请人: Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Alex De Vries
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman, LLP
- 优先权: EP03253058 20030516
- 主分类号: G03B27/32
- IPC分类号: G03B27/32 ; G03B27/68
摘要:
In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.
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