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1.发明授权Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method 失效光刻设备的校准方法，校准方法，计算机程序，数据存储介质，光刻设备和器件制造方法公开(公告)号：US07253884B2
公开(公告)日：2007-08-07
申请号：US10845521
申请日：2004-05-14
CPC分类号： G03F9/7019 , G03F9/7003 , G03F9/7011 , G03F9/7084
摘要： In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.
摘要翻译： 在补偿前后对准光学元件的失真的一种方法中，计算衬底标记的估计位置与衬底标记的实际位置之间的位移矢量。 还通过将参考基板移动固定量并且比较参考基板的背面上的点的图像移动到基板的正面上的对应点移动多远的距离来计算光学校正阵列。 然后可以使用位移矢量和光学校正阵列来精确地计算另外的衬底的位置。
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公开(公告)号：US08576374B2
公开(公告)日：2013-11-05
申请号：US12393805
申请日：2009-02-26
申请人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
发明人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
摘要翻译： 根据本发明的第一方面，提供了一种在设置在基板上的层上提供对准标记的光刻方法，所述方法包括在所述层的一定范围内定向的区域上提供对准标记 相对于其上设置有该层的基板的表面。
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3.发明授权Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby 失效对准工具，光刻设备，对准方法，器件制造方法和由此制造的器件公开(公告)号：US07193231B2
公开(公告)日：2007-03-20
申请号：US10648785
申请日：2003-08-27
申请人： Joeri Lof , Fransiscus Godefridus Casper Bijnen , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui
发明人： Joeri Lof , Fransiscus Godefridus Casper Bijnen , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui
IPC分类号： G01B11/00
CPC分类号： G03F9/7084 , G03F9/7076
摘要： An optical element is placed in the alignment beam during alignment. The optical element serves to focus the alignment beam onto the substrate alignment mark when it is at a different focal length from the front surface of the substrate.
摘要翻译： 在对准期间将光学元件放置在对准光束中。 当光学元件处于与衬底的前表面不同的焦距时，该光学元件用于将对准光束聚焦到衬底对准标记上。
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4.发明授权Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods 失效校准方法，校准基板，光刻设备和器件制造方法公开(公告)号：US06936385B2
公开(公告)日：2005-08-30
申请号：US10374510
申请日：2003-02-27
申请人： Joeri Lof , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen
发明人： Joeri Lof , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Fransiscus Godefridus Casper Bijnen
CPC分类号： G03F9/7019 , G03F9/7011 , G03F9/7084
摘要： To calibrate a front-to-backside alignment system a transparent calibration substrate with reference markers on opposite sides is used. A plane plate is inserted to displace the focal position of the alignment system from the top to bottom surface of the calibration substrate.
摘要翻译： 为了校准前后对齐系统，使用带有相对侧的参考标记的透明校准基板。 插入平板以从校准基板的顶面到底面移动对准系统的焦点位置。
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5.发明授权公开(公告)号：US06914664B2
公开(公告)日：2005-07-05
申请号：US10365603
申请日：2003-02-13
申请人： Keith Frank Best , Alexander Friz , Joseph J. Consolini , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui
发明人： Keith Frank Best , Alexander Friz , Joseph J. Consolini , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F9/7069 , G03F9/7076 , G03F9/7084
摘要： To align between layers having a large Z separation, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side.
摘要翻译： 为了在具有大Z分离的层之间进行对准，使用以正常入射辐射照亮参考标记的对准系统。 对准系统具有在基板侧上是远心的照明系统。
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公开(公告)号：US20090237635A1
公开(公告)日：2009-09-24
申请号：US12393805
申请日：2009-02-26
申请人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
发明人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
摘要翻译： 根据本发明的第一方面，提供了一种在设置在基板上的层上提供对准标记的光刻方法，所述方法包括在所述层的一定范围内定向的区域上提供对准标记 相对于其上设置有该层的基板的表面。
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公开(公告)号：US07064807B2
公开(公告)日：2006-06-20
申请号：US10840360
申请日：2004-05-07
申请人： Cheng-Qun Gui , Henricus Wilhelmus Maria Van Buel , Maurits Van Der Schaar , Arie Jeffrey Den Boef
发明人： Cheng-Qun Gui , Henricus Wilhelmus Maria Van Buel , Maurits Van Der Schaar , Arie Jeffrey Den Boef
CPC分类号： G03F7/70691 , G03F7/70216 , G03F9/7084
摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system.
摘要翻译： 光刻投影装置设置有内置在晶片台中的光学系统，用于产生设置在晶片背面的晶片标记的图像。 图像位于晶片正面的平面上，并且可以通过对准系统从晶片的正面观察。 可以使用预先存在的对准系统来执行晶片背面和前面的标记与掩模之间的同时对准。
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8.发明授权Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program 有权用于对基板的正面或背面进行成像的平版印刷设备，基板识别方法，器件制造方法，基板和计算机程序公开(公告)号：US07480028B2
公开(公告)日：2009-01-20
申请号：US11069058
申请日：2005-03-02
申请人： Michael Van Der Veen , Anastasius Jacobus Anicetus Bruinsma , Henricus Wilhelmus Maria Van Buel , Jacob Fredrik Friso Klinkhamer , Martinus Hendrikus Antonius Leenders , Christianus Gerardus Maria De Mol , Hubert Adriaan Van Mierlo
发明人： Michael Van Der Veen , Anastasius Jacobus Anicetus Bruinsma , Henricus Wilhelmus Maria Van Buel , Jacob Fredrik Friso Klinkhamer , Martinus Hendrikus Antonius Leenders , Christianus Gerardus Maria De Mol , Hubert Adriaan Van Mierlo
CPC分类号： G03F9/7084 , G03F7/70425 , G03F9/7011 , G03F9/7019 , G03F9/7076
摘要： The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance. The two features are selected from a plurality of features that may be placed on a back side or a front side of a substrate. An optical system is provided for reading the features from the back side or a front side of the substrate.
摘要翻译： 本发明旨在通过将未识别基底上的两个特征之间的测量距离与一个或多个存储的距离进行比较来实现基底识别。 一个或多个存储的距离是在一个或多个基板的设计期间的距离。 通过与测量距离对应的存储距离来识别未识别的底物。 两个特征从可以放置在基板的背面或前侧的多个特征中选择。 提供了用于从基板的背面或前侧读取特征的光学系统。
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9.发明授权Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method 有权在光刻设备中预先对准衬底，器件制造方法以及通过制造方法制造的器件公开(公告)号：US07342642B2
公开(公告)日：2008-03-11
申请号：US11155885
申请日：2005-06-20
申请人： Henricus Wilhelmus Maria Van Buel , Peter Ten Berge , Markus Theodoor Wilhelmus Van Der Heijden
发明人： Henricus Wilhelmus Maria Van Buel , Peter Ten Berge , Markus Theodoor Wilhelmus Van Der Heijden
CPC分类号： G03F9/7011 , G03F9/7084 , G03F9/7088
摘要： A method of pre-aligning a substrate in a lithographic apparatus is described. The substrate has at least one alignment mark provided on a side of the substrate. The method includes determining a relationship between a position of the at least one alignment mark, at least part of an edge of the substrate, and a center of the substrate. A substrate support is provided to support a substrate, the substrate support having at least one optical view window at a predetermined location to view a part of the side of the substrate. The substrate is placed on the substrate support on the basis of the relationship to position the at least one alignment mark in the at least one optical view window.
摘要翻译： 描述了在光刻设备中预对准衬底的方法。 衬底具有设置在衬底一侧上的至少一个对准标记。 所述方法包括确定所述至少一个对准标记的位置与所述基板的边缘的至少一部分与所述基板的中心之间的关系。 提供衬底支撑件以支撑衬底，衬底支撑件在预定位置处具有至少一个光学视窗，以观察衬底侧面的一部分。 基于该关系将基板放置在基板支撑件上，以将至少一个对准标记定位在至少一个光学视窗中。
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公开(公告)号：US07094506B2
公开(公告)日：2006-08-22
申请号：US10795801
申请日：2004-03-09
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70383
摘要： A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).
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