发明授权
- 专利标题: Method of making a microfluid ejection head structure
- 专利标题(中): 制造微流体喷射头结构的方法
-
申请号: US11026504申请日: 2004-12-30
-
公开(公告)号: US07254890B2公开(公告)日: 2007-08-14
- 发明人: Johnathan L. Barnes , Craig M. Bertelsen , Brian C. Hart , Gary R. Williams , Sean T. Weaver , Girish S. Patil
- 申请人: Johnathan L. Barnes , Craig M. Bertelsen , Brian C. Hart , Gary R. Williams , Sean T. Weaver , Girish S. Patil
- 申请人地址: US KY Lexington
- 专利权人: Lexmark International, Inc.
- 当前专利权人: Lexmark International, Inc.
- 当前专利权人地址: US KY Lexington
- 代理机构: Luedeka, Neely & Graham, PC
- 主分类号: B21D53/76
- IPC分类号: B21D53/76 ; B41J2/04
摘要:
A method of making a micro-fluid ejection head structure for a micro-fluid ejection device. The method includes applying a removable mandrel material to a semiconductor substrate wafer containing fluid ejection actuators on a device surface thereof. The mandrel material is shaped to provide fluid chamber and fluid channel locations on the substrate wafer. A micro machinable material is applied to the shaped mandrel and the device surface of the wafer to provide a nozzle plate and flow feature layer on the shaped mandrel and wafer. A plurality of nozzle holes are formed in the nozzle plate and flow feature layer. The shaped mandrel material is then removed from the device surface of the substrate wafer to provide fluid chambers and fluid channels in the nozzle plate and flow feature layer.
公开/授权文献
- US20060146092A1 Process for making a micro-fluid ejection head structure 公开/授权日:2006-07-06
信息查询