Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US11038929Application Date: 2005-01-18
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Publication No.: US07256453B2Publication Date: 2007-08-14
- Inventor: Hidekatsu Onose , Atsuo Watanabe
- Applicant: Hidekatsu Onose , Atsuo Watanabe
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Hogan & Hartson LLP
- Priority: JP2002-366886 20021218
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94

Abstract:
A structure is provided that ensures a low on-resistance and a better blocking effect. In a lateral type SIT (Static Induction Transistor) in which a first region is used as a p+ gate and a gate electrode is formed on the bottom of the first region, the structure is built such that the p+ gate and an n+ source are contiguous. An insulating film is formed on the surface of an n− channel, and an auxiliary gate electrode is formed on the insulating film. In addition, the auxiliary gate electrode and the source electrode are shorted.
Public/Granted literature
- US20050121717A1 Semiconductor device Public/Granted day:2005-06-09
Information query
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