Invention Grant
- Patent Title: Processing method using probe of scanning probe microscope
- Patent Title (中): 使用扫描探针显微镜探头的加工方法
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Application No.: US11135076Application Date: 2005-05-23
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Publication No.: US07259372B2Publication Date: 2007-08-21
- Inventor: Osamu Takaoka , Masatoshi Yasutake , Shigeru Wakiyama , Naoya Watanabe
- Applicant: Osamu Takaoka , Masatoshi Yasutake , Shigeru Wakiyama , Naoya Watanabe
- Applicant Address: JP
- Assignee: SII NanoTechnology Inc.
- Current Assignee: SII NanoTechnology Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2004-154059 20040525
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
A processing method uses a probe of a scanning probe microscope. A fine marker is formed in a processing material by thrusting the probe, which is made of a material harder than the processing material, into a portion of the processing material disposed in the vicinity of an area of the processing material to be processed by the probe during a processing operation. A position of the fine marker on the processing material is detected during the processing operation. A drift amount of the area of the processing material is calculated in accordance with the detected position of the fine marker. A position of the area of the processing material is corrected in accordance with the calculated drift amount.
Public/Granted literature
- US20050263700A1 Processing method using probe of scanning probe microscope Public/Granted day:2005-12-01
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