发明授权
- 专利标题： Advance ridge structure for microlens gapless approach
- 专利标题（中）： 用于微透镜无间隙方法的前进脊结构
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申请号： US11064452申请日： 2005-02-23
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公开(公告)号： US07264976B2公开(公告)日： 2007-09-04
- 发明人: Jack Deng , Chin Chen Kuo , Fu-Tien Weng , Chih-Kung Chang , Bii-Junq Chang
- 申请人： Jack Deng , Chin Chen Kuo , Fu-Tien Weng , Chih-Kung Chang , Bii-Junq Chang
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Haynes and Boone, LLP
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A method of manufacturing a plurality of microlenses on a substrate comprises forming a grid having raised ridges defining a plurality of openings on the substrate and forming a plurality of patterned photoresist features each disposed within one of the plurality of openings. The plurality of patterned photoresist features can then be reflowed inside the grid.
公开/授权文献
- US20060189062A1 Advance ridge structure for microlens gapless approach 公开/授权日：2006-08-24
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