Invention Grant
- Patent Title: Measurement system with an optical measurement arrangement
- Patent Title (中): 具有光学测量装置的测量系统
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Application No.: US10780759Application Date: 2004-02-19
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Publication No.: US07277190B2Publication Date: 2007-10-02
- Inventor: Matthias Slodowski , Detlef Wolter
- Applicant: Matthias Slodowski , Detlef Wolter
- Applicant Address: DE Jena
- Assignee: Vistec Semiconductor Systems Jena GmbH
- Current Assignee: Vistec Semiconductor Systems Jena GmbH
- Current Assignee Address: DE Jena
- Agency: Foley & Lardner LLP
- Priority: DE10309033 20030301
- Main IPC: G01B11/28
- IPC: G01B11/28 ; G01N21/86 ; G01V8/00 ; B60Q3/04 ; F21V1/00 ; F21V11/00 ; F21V15/00

Abstract:
The invention concerns an optical measurement arrangement, in particular for the examination of layer systems, and can include an illumination device having at least one illumination source for delivering a measurement light beam and coupling the measurement light beam into the beam path of a layer thickness measuring instrument. In such a measurement arrangement, the illumination device can be housed in a lamp housing that may be detachably connected to the remaining portion of the measurement arrangement via an installation element wherein illumination sources can be prealigned with respect to the beam path.
Public/Granted literature
- US20040169868A1 Optical measurement arrangement Public/Granted day:2004-09-02
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