发明授权
- 专利标题: Particle detection device, lithographic apparatus and device manufacturing method
- 专利标题(中): 粒子检测装置,光刻设备及器件制造方法
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申请号: US11242146申请日: 2005-10-04
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公开(公告)号: US07283225B2公开(公告)日: 2007-10-16
- 发明人: Johannes Onvlee , Raimond Visser , Peter Ferdinand Greve , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
- 申请人: Johannes Onvlee , Raimond Visser , Peter Ferdinand Greve , Johannes Hendrikus Gertrudis Franssen , Erwin Theodorus Jacoba Verhagen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level. The detector system may include a radiation detector device configured to generate the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device and a radiation blocking assembly configured to prevent radiation not originating from a particle from being incident on the predetermined part of the detector device.