发明授权
- 专利标题: Collector for EUV light source
- 专利标题(中): EUV光源收集器
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申请号: US11603670申请日: 2006-11-21
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公开(公告)号: US07288778B2公开(公告)日: 2007-10-30
- 发明人: William N. Partio , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov
- 申请人: William N. Partio , Norbert Bowering , Alexander I. Ershov , Igor V. Fomenkov
- 申请人地址: US CA San Diego
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego
- 代理商 William Cray
- 主分类号: H01J35/20
- IPC分类号: H01J35/20
摘要:
It will be understood that an apparatus and method is disclosed, which may comprise a multi-layer reflecting coating forming an EUV reflective surface which may comprise a spectral filter tuned to selectively highly reflect light in a band centered about at a first preferred wavelength and to significantly reduce the reflection of light at a band centered about a second wavelength, e.g., it may be tuned to reflect maximally or almost maximally, near the top of the reflectivity curve, e.g., at around 13.5 nm and at a significantly lower reflectivity at, e.g., around 11 nm, to discriminate against light near 11 nm and favor light at around 13.5 nm. The spectral filter may comprise a plurality of nested grazing angle of incidence shells comprising reflective surfaces comprising the multi-layer reflective coating. e.g. multilayer mirrors, e.g., with one or more reflecting surfaces per shell.
公开/授权文献
- US20070114469A1 Collector for EUV light source 公开/授权日:2007-05-24
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