发明授权
US07289597B2 Optical axis adjusting mechanism for X-ray lens, X-ray analytical instrument, and method of adjusting optical axis of X-ray lens
有权
X射线透镜的光轴调整机构,X射线分析仪器以及调整X射线透镜的光轴的方法
- 专利标题: Optical axis adjusting mechanism for X-ray lens, X-ray analytical instrument, and method of adjusting optical axis of X-ray lens
- 专利标题(中): X射线透镜的光轴调整机构,X射线分析仪器以及调整X射线透镜的光轴的方法
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申请号: US11389447申请日: 2006-03-24
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公开(公告)号: US07289597B2公开(公告)日: 2007-10-30
- 发明人: Norio Sasayama , Akikazu Okawara , Satoshi Nakayama
- 申请人: Norio Sasayama , Akikazu Okawara , Satoshi Nakayama
- 申请人地址: JP
- 专利权人: SII NanoTechnology Inc.
- 当前专利权人: SII NanoTechnology Inc.
- 当前专利权人地址: JP
- 代理机构: Adams & Wilks
- 优先权: JP2005-114513 20050412
- 主分类号: G21K7/00
- IPC分类号: G21K7/00
摘要:
An optical axis adjusting mechanism for an X-ray lens, an X-ray analytical instrument and a method of adjusting an optical axis of an X-ray lens, capable of enhancing detection efficiency of an X-ray while preventing degradation of the device performance are provided. An optical axis adjusting mechanism for an X-ray lens to be implemented in an X-ray analytical instrument, includes an exit side adjusting mechanism for adjusting an exit side focal point of the X-ray lens to focus on an X-ray detector, and an entrance side adjusting mechanism for adjusting an entrance side focal point of the X-ray lens to focus on an analytical point of a sample, and the entrance side adjusting mechanism is disposed with a greater distance from the X-ray lens than a distance between the exit side adjusting mechanism and the X-ray lens.