发明授权
- 专利标题: Discharge produced plasma EUV light source
- 专利标题(中): 放电产生等离子体EUV光源
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申请号: US11493945申请日: 2006-07-26
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公开(公告)号: US07291853B2公开(公告)日: 2007-11-06
- 发明人: Igor V. Fomenkov , William N. Partlo , Gerry M. Blumenstock , Nortbert Bowering , I. Roger Oliver , Xiaojiang Pan , Rodney D. Simmons
- 申请人: Igor V. Fomenkov , William N. Partlo , Gerry M. Blumenstock , Nortbert Bowering , I. Roger Oliver , Xiaojiang Pan , Rodney D. Simmons
- 申请人地址: US CA San Diego
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego
- 代理商 William Cray
- 主分类号: H01J65/04
- IPC分类号: H01J65/04
摘要:
An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.
公开/授权文献
- US20070023711A1 Discharge produced plasma EUV light source 公开/授权日:2007-02-01