Collector for EUV light source
    5.
    发明授权
    Collector for EUV light source 有权
    EUV光源收集器

    公开(公告)号:US07217940B2

    公开(公告)日:2007-05-15

    申请号:US10798740

    申请日:2004-03-10

    IPC分类号: H01J35/20

    摘要: A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

    摘要翻译: 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置,其可以包括反射表面,其包括第一材料,并且所述碎屑包括第二材料和/或第二材料的化合物,所述系统 并且方法可以包括受控的溅射离子源,其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构,所选择的离子化状态具有围绕选择的能量峰的分布,其具有溅射第二材料的可能性很高,并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。

    Plasma focus light source with improved pulse power system
    6.
    发明授权
    Plasma focus light source with improved pulse power system 失效
    等离子聚焦光源具有改进的脉冲电源系统

    公开(公告)号:US06566667B1

    公开(公告)日:2003-05-20

    申请号:US09690084

    申请日:2000-10-16

    IPC分类号: H05H134

    摘要: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially with the anode on the axis. The anode is preferably hollow and the active gas is introduced through the anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. A heat pipe cooling system is described for cooling the central anode.

    摘要翻译: 高能光子源。 一对等离子体夹紧电极位于真空室中。 该室包含工作气体,其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源在电压足够高的电压下提供电脉冲,以在电极之间产生放电,以在工作气体中产生非常高温度,高密度的等离子体夹持,从而在源或活性气体的光谱线处提供辐射。 优选地,电极与轴上的阳极同轴地配置。 阳极优选是中空的,并且活性气体通过阳极引入。 这允许对光谱线源进行优化和缓冲气体的单独优化。 本发明优选的实施例公开了电容值的优化,阳极长度和形状以及优选的活性气体输送系统。 优选实施例还包括脉冲功率系统,其包括充电电容器和包括脉冲变压器的磁压缩电路。 描述了用于冷却中央阳极的热管冷却系统。

    EUV light source
    8.
    发明授权
    EUV light source 有权
    EUV光源

    公开(公告)号:US07323703B2

    公开(公告)日:2008-01-29

    申请号:US11647007

    申请日:2006-12-27

    IPC分类号: H01J35/20

    摘要: An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

    摘要翻译: 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外(“EUV”)光源多层收集器的装置和方法; 等离子体形成室内的壳体,具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开,并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅,硅,Zerodur或ULE玻璃,铝,铍,钼,铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器,以将壳体的稳态温度维持在所选择的工作温度范围内。

    Gas discharge laser with roller bearings and stable magnetic axial
positioning
    9.
    发明授权
    Gas discharge laser with roller bearings and stable magnetic axial positioning 有权
    气体放电激光与滚子轴承和稳定的磁轴定位

    公开(公告)号:US06026103A

    公开(公告)日:2000-02-15

    申请号:US290852

    申请日:1999-04-13

    IPC分类号: H01S3/036 H01S3/00

    CPC分类号: H01S3/036

    摘要: An electric discharge gas laser having a laser cavity in which is contained a laser gas and a fan for circulating the laser gas. The fan is supported in position radially by a roller bearing system and axially at least in part by magnetic forces. In a preferred embodiment the magnetic forces are supplied by a brushless DC motor in which the rotor of the motor is sealed within the gas environment of the laser cavity and the motor stator is located outside the gas environment. The magnetic center of the rotor is offset from the center of the stator to produce a magnetic reluctance generated force on the shaft that acts axially on the shaft toward the non-drive end and is reacted by a ball and plate bearing assembly mounted along the axis of rotation at the opposite end of the shaft.

    摘要翻译: 一种具有激光腔的放电气体激光器,其中包含激光气体和用于使激光气体循环的风扇。 风扇通过滚子轴承系统径向支撑在位置,并至少部分地由磁力轴向地支撑。 在优选实施例中,磁力由无刷直流电动机提供,其中电机的转子在激光腔的气体环境内被密封,并且电动机定子位于气体环境的外部。 转子的磁心偏离定子的中心,以产生轴上的磁阻产生力,该轴在轴上朝向非驱动端轴向作用,并且通过沿着轴线安装的球和轴承组件反作用 在轴的相对端旋转。

    Plasma focus light source with improved pulse power system
    10.
    发明授权
    Plasma focus light source with improved pulse power system 失效
    等离子聚焦光源具有改进的脉冲电源系统

    公开(公告)号:US06815700B2

    公开(公告)日:2004-11-09

    申请号:US10189824

    申请日:2002-07-03

    IPC分类号: H05H104

    摘要: The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. Special techniques are described for cooling the central electrode. In one example, water is circulated through the walls of the hollow electrode. In another example, a heat pipe cooling system is described for cooling the central electrode.

    摘要翻译: 本发明提供了一种高能量光子源。 一对等离子体夹紧电极位于真空室中。 该室包含工作气体,其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源在电压足够高的电压下提供电脉冲,以在电极之间产生放电,以在工作气体中产生非常高温度,高密度的等离子体夹持,从而在源或活性气体的光谱线处提供辐射。 优选地,电极被同轴配置。 中心电极优选是中空电极,并且活性气体从中空电极引出。 这允许对光谱线源进行优化和缓冲气体的单独优化。 在优选的实施例中,中心电极用高的负电脉冲脉冲,使得中心电极用作空心阴极。 本发明优选的实施例公开了电容值的优化,阳极长度和形状以及优选的活性气体输送系统。 优选实施例还包括脉冲功率系统,其包括充电电容器和包括脉冲变压器的磁压缩电路。 描述了用于冷却中心电极的特殊技术。 在一个实例中,水通过中空电极的壁循环。 在另一个实例中,描述了用于冷却中心电极的热管冷却系统。