发明授权
- 专利标题: Method of manufacturing liquid discharge head
- 专利标题(中): 液体排放头的制造方法
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申请号: US11481796申请日: 2006-07-07
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公开(公告)号: US07300596B2公开(公告)日: 2007-11-27
- 发明人: Hiroyuki Murayama , Shuji Koyama , Yoshinori Tagawa , Kenji Fujii , Masaki Ohsumi , Yoshinobu Urayama , Jun Yamamuro , Tsuyoshi Takahashi , Masahisa Watanabe
- 申请人: Hiroyuki Murayama , Shuji Koyama , Yoshinori Tagawa , Kenji Fujii , Masaki Ohsumi , Yoshinobu Urayama , Jun Yamamuro , Tsuyoshi Takahashi , Masahisa Watanabe
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2005-214812 20050725; JP2006-171254 20060621
- 主分类号: B41J2/05
- IPC分类号: B41J2/05 ; H01L21/00
摘要:
The method of manufacturing a recording head has a flow path wall forming step of forming flow path walls on a substrate having energy generating elements formed thereon, an imbedded material depositing step of depositing an imbedded material between the flow path walls and on a top of each flow path wall, a flattening step of polishing a top of the deposited imbedded material, until the top of the flow path wall is exposed, and a step of forming an orifice plate on the tops of the polished imbedded material and the exposed flow path wall. In the step of forming the flow path walls, patterning of a close contact property improvement layer is simultaneously performed to improve a close contact property between the flow path wall and the substrate.
公开/授权文献
- US20070017894A1 Method of manufacturing liquid discharge head 公开/授权日:2007-01-25
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