发明授权
- 专利标题： Semiconductor component having at least one organic semiconductor layer and method for fabricating the same
- 专利标题（中）： 具有至少一个有机半导体层的半导体部件及其制造方法
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申请号： US11066732申请日： 2005-02-25
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公开(公告)号： US07303940B2公开(公告)日： 2007-12-04
- 发明人: Florian Eder , Marcus Halik , Hagen Klauk , Günter Schmid , Ute Zschieschang
- 申请人： Florian Eder , Marcus Halik , Hagen Klauk , Günter Schmid , Ute Zschieschang
- 申请人地址： DE Munich
- 专利权人： Infineon Technologies AG
- 当前专利权人： Infineon Technologies AG
- 当前专利权人地址： DE Munich
- 代理机构： Slater & Matsil, L.L.P.
- 优先权： DE102004010094 20040227
- 主分类号： H01L51/40
- IPC分类号： H01L51/40 ; H01L21/4763 ; H01L51/00 ; H01L23/58
摘要：
A semiconductor component has at least one organic semiconductor layer. The component also includes at least one protective layer for at least partially covering the at least one organic semiconductor layer to protect against environmental influences. The at least one protective layer contains a proportion of an alkane with CnH2n+1 and n greater than or equal to 15 or consists entirely of an alkane of this type, or of a mixture of alkanes of this type. In one example, the protective layer is a paraffin wax. This creates a high resistance to moisture.
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