发明授权
US07306990B2 Information storage element, manufacturing method thereof, and memory array
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信息存储元件,其制造方法和存储器阵列
- 专利标题: Information storage element, manufacturing method thereof, and memory array
- 专利标题(中): 信息存储元件,其制造方法和存储器阵列
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申请号: US10535941申请日: 2003-11-28
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公开(公告)号: US07306990B2公开(公告)日: 2007-12-11
- 发明人: Shinya Yamaguchi , Masahiko Ando , Toshikazu Shimada , Natsuki Yokoyama , Shunri Oda , Nobuyoshi Koshida
- 申请人: Shinya Yamaguchi , Masahiko Ando , Toshikazu Shimada , Natsuki Yokoyama , Shunri Oda , Nobuyoshi Koshida
- 申请人地址: JP Saitama
- 专利权人: Japan Science & Technology Agency
- 当前专利权人: Japan Science & Technology Agency
- 当前专利权人地址: JP Saitama
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP.
- 优先权: JP2002-349249 20021129
- 国际申请: PCT/JP03/15292 WO 20031128
- 国际公布: WO2004/051751 WO 20040617
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L21/00 ; H01L29/788 ; H01L21/3205 ; H01L21/4763 ; H01L29/76
摘要:
An information memory device capable of reading and writing of information by mechanical operation of a floating gate layer, in which a gate insulation film has a cavity (6), and a floating gate layer (5) having two stable deflection states in the cavity (6), the state stabilized by deflecting toward the channel side of transistor, and the state stabilized by deflecting toward the gate (7) side, writing and reading of information can be made by changing the stable deflection state of the floating gate layer (5) by Coulomb interactive force between the electrons (or positive holes 8) accumulated in the floating gate layer (5) and external electric field, and by reading the channel current change based on the state of the floating gate layer (5).
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