发明授权
US07307263B2 Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
有权
平版印刷设备，辐射系统，污染物捕集阱，装置制造方法以及在污染物捕集器中捕获污染物的方法
- 专利标题： Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
- 专利标题（中）： 平版印刷设备，辐射系统，污染物捕集阱，装置制造方法以及在污染物捕集器中捕获污染物的方法
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申请号： US10890404申请日： 2004-07-14
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公开(公告)号： US07307263B2公开(公告)日： 2007-12-11
- 发明人: Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Cornelis Petrus Andreas Maria Luijkx , Frank Jeroen Pieter Schuurmans
- 申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Cornelis Petrus Andreas Maria Luijkx , Frank Jeroen Pieter Schuurmans
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.
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