公开(公告)号：US07307263B2

公开(公告)日：2007-12-11

申请号：US10890404

申请日：2004-07-14

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Cornelis Petrus Andreas Maria Luijkx ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Cornelis Petrus Andreas Maria Luijkx ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

摘要翻译： 光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑 图案形成装置。 图案形成装置用于使经调节的辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。 污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。 陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。

公开(公告)号：US20060138350A1

公开(公告)日：2006-06-29

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。

公开(公告)号：US06838684B2

公开(公告)日：2005-01-04

申请号：US10644954

申请日：2003-08-21

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

IPC分类号： G03F7/20 ,  H01L21/027 ,  G21G5/00

CPC分类号： G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the EUV radiation can be transferred on debris present in the EUV beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced.

公开(公告)号：US07057190B2

公开(公告)日：2006-06-06

申请号：US11000381

申请日：2004-12-01

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

IPC分类号： G03F7/20

CPC分类号： G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

摘要翻译： 用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。 箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。 箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。

公开(公告)号：US07468521B2

公开(公告)日：2008-12-23

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21G5/00 ,  G01J3/10 ,  G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US07193229B2

公开(公告)日：2007-03-20

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Yurievich Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Yurievich Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H01J49/00

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。

公开(公告)号：US07034308B2

公开(公告)日：2006-04-25

申请号：US10873646

申请日：2004-06-23

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Ralph Kurt ,  Frank Jeroen Pieter Schuurmans ,  Yurii Victorovitch Sidelnikov

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Ralph Kurt ,  Frank Jeroen Pieter Schuurmans ,  Yurii Victorovitch Sidelnikov

IPC分类号： G21G5/00 ,  G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70916

摘要： A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.

摘要翻译： 辐射系统包括在收集器例如正入射收集器和辐射源之间的污染屏障，例如箔阱，使得来自源的辐射通过箔阱两次。 辐射在撞击收集器之前通过污染屏障一次，并在收集器反射之后经过第二次。 箔捕获器包括平行于来自光源的辐射和由收集器反射的辐射的片层。 因此辐射不被箔陷阱阻挡。 以这种方式，可以保护与等离子体产生的源一起使用的正常入射收集器免受来自EUV源的碎片。

公开(公告)号：US07279690B2

公开(公告)日：2007-10-09

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

IPC分类号： H05H3/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US20080266654A1

公开(公告)日：2008-10-30

申请号：US11790681

申请日：2007-04-26

申请人： Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Frank Jeroen Pieter Schuurmans ,  Vladimir Mihailovitch Krivtsun ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Frank Jeroen Pieter Schuurmans ,  Vladimir Mihailovitch Krivtsun ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G02B21/00

CPC分类号： G21K7/00

摘要： An extreme ultraviolet (EUV) microscope configured to analyze a sample. The microscope includes a source of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2-6 nm, and an optical system constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in-phase reflection of at least a portion of the radiation in the range of about 2-6 nm.

摘要翻译： 配置用于分析样品的极紫外（EUV）显微镜。 显微镜包括EUV辐射源，其被构造和布置成产生具有至少在约2-6nm范围内的波长的EUV辐射，以及构造和布置成用EUV辐射照射样品并收集一个 样品发出的辐射。 光学系统布置有至少一个反射镜，该反射镜包括多层结构，用于至少部分辐射在约2-6nm范围内的同相反射。

公开(公告)号：US07167232B2

公开(公告)日：2007-01-23

申请号：US10747613

申请日：2003-12-30

申请人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

发明人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

IPC分类号： G03B27/42

CPC分类号： G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

摘要翻译： 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。