公开(公告)号：US07307263B2

公开(公告)日：2007-12-11

申请号：US10890404

申请日：2004-07-14

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Cornelis Petrus Andreas Maria Luijkx ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Cornelis Petrus Andreas Maria Luijkx ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

摘要翻译： 光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑 图案形成装置。 图案形成装置用于使经调节的辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。 污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。 陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。