发明授权
US07314054B2 Liquid processing apparatus with nozzle having planar ejecting orifices
有权
具有喷嘴的液体处理装置具有平面喷射孔
- 专利标题： Liquid processing apparatus with nozzle having planar ejecting orifices
- 专利标题（中）： 具有喷嘴的液体处理装置具有平面喷射孔
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申请号： US09801106申请日： 2001-02-28
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公开(公告)号： US07314054B2公开(公告)日： 2008-01-01
- 发明人: Koji Egashira , Yuji Kamikawa
- 申请人： Koji Egashira , Yuji Kamikawa
- 申请人地址： JP Tokyo-To
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo-To
- 代理机构： Smith, Gambrell & Russell, LLP
- 优先权： JP2000-053402 20000229
- 主分类号： B08B3/02
- IPC分类号： B08B3/02
摘要：
A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in order to perform a liquid process. The nozzles 54, 56 are respectively equipped with a plurality of ejecting orifices 53, 55 capable of ejecting the processing liquid in a plane manner, allowing the substrates W to be processed uniformly and effectively.
公开/授权文献
- US20020029789A1 Liquid processing apparatus and method 公开/授权日：2002-03-14
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