发明授权
US07326520B2 Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
有权
具有仲羟基的脂环式烯烃和丙烯酸类化合物的共聚物，以及含有该羟基的化学增幅抗蚀剂组合物
- 专利标题： Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same
- 专利标题（中）： 具有仲羟基的脂环式烯烃和丙烯酸类化合物的共聚物，以及含有该羟基的化学增幅抗蚀剂组合物
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申请号： US11108397申请日： 2005-04-18
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公开(公告)号： US07326520B2公开(公告)日： 2008-02-05
- 发明人: Hyun-Sang Joo , Joo-Hyeon Park , Dong-Chul Seo , Young-Taek Lim , Seong-Duk Cho , Ji-Young Song , Kyoung-Mun Kim
- 申请人： Hyun-Sang Joo , Joo-Hyeon Park , Dong-Chul Seo , Young-Taek Lim , Seong-Duk Cho , Ji-Young Song , Kyoung-Mun Kim
- 申请人地址： KR Chongno-gu Seoul
- 专利权人： Korea Kumho Petrochemical Co., Ltd.
- 当前专利权人： Korea Kumho Petrochemical Co., Ltd.
- 当前专利权人地址： KR Chongno-gu Seoul
- 代理机构： Davidson, Davidson, & Kappel, LLC
- 优先权： KR10-2004-0072926 20040913
- 主分类号： G03F7/30
- IPC分类号： G03F7/30 ; G03F7/038 ; C08F224/00 ; C08F236/00
摘要：
The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window:
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