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    Polymer and chemically amplified resist composition containing the same
    3.
    发明授权
    Polymer and chemically amplified resist composition containing the same 有权
    含有其的聚合物和化学放大抗蚀剂组合物

    公开(公告)号：US07285373B2

    公开(公告)日：2007-10-23

    申请号：US10940469

    申请日：2004-09-14

    申请人： Young-Taek Lim ,  Joo-Hyeon Park ,  Dong-Chul Seo ,  Chang-Min Kim ,  Seong-Duk Cho ,  Hyun-Sang Joo

    发明人： Young-Taek Lim ,  Joo-Hyeon Park ,  Dong-Chul Seo ,  Chang-Min Kim ,  Seong-Duk Cho ,  Hyun-Sang Joo

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397

    摘要： A chemically amplified resist composition includes a novel polymer, a photoacid generator, and a solvent.The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.

    摘要翻译： 化学放大抗蚀剂组合物包括新型聚合物，光致酸产生剂和溶剂。 化学放大抗蚀剂可以形成粘合性优异，对基板的依赖性低，抗紫外波长范围如KrF准分子激光器或ArF准分子激光器的透光性，耐干蚀刻性，灵敏度，分辨率和显影性。 此外，聚合物含有最大数量的饱和脂肪族环，以提高耐蚀刻性，并且还包括作为溶液的烷基烷基酯单体引入的常规聚丙烯酸酯抗蚀剂相对于图案的边缘粗糙度的问题，形成均匀的 由于通过丙烯酸烷氧基烷基酯单体与酸的脱保护反应与甲醛和羧酸酯化合物一起产生的烷基醇化合物作为图案中的溶剂或消泡剂，因此图案的边缘。

    Novel polymer and chemically amplified resist composition containing the same
    4.
    发明申请
    Novel polymer and chemically amplified resist composition containing the same 有权
    含有其的新型聚合物和化学增幅抗蚀剂组合物

    公开(公告)号：US20050153236A1

    公开(公告)日：2005-07-14

    申请号：US10940469

    申请日：2004-09-14

    申请人： Young-Taek Lim ,  Joo-Hyeon Park ,  Dong-Chul Seo ,  Chang-Min Kim ,  Seong-Duk Cho ,  Hyun-Sang Joo

    发明人： Young-Taek Lim ,  Joo-Hyeon Park ,  Dong-Chul Seo ,  Chang-Min Kim ,  Seong-Duk Cho ,  Hyun-Sang Joo

    IPC分类号： G03F7/033 ,  C08F212/08 ,  C08F216/12 ,  C08F220/10 ,  C08F222/06 ,  C08F232/00 ,  C08G61/04 ,  G03C1/76 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397

    摘要： The present invention provides a chemically amplified resist composition including a novel polymer, a photoacid generator, and a solvent: The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.

    摘要翻译： 本发明提供一种包含新型聚合物，光酸产生剂和溶剂的化学放大抗蚀剂组合物：化学增幅抗蚀剂可以形成粘合性优异，对基材的依赖性低的抗蚀剂图案，远紫外线波长的透明度 范围如KrF准分子激光器或ArF准分子激光器，干蚀刻电阻，灵敏度，分辨率和显影性。 此外，聚合物含有最大数量的饱和脂肪族环，以提高耐蚀刻性，并且还包括作为溶液的烷基烷基酯单体引入的常规聚丙烯酸酯抗蚀剂相对于图案的边缘粗糙度的问题，形成均匀的 由于通过丙烯酸烷氧基烷基酯单体与酸的脱保护反应与甲醛和羧酸酯化合物一起产生的烷基醇化合物作为图案中的溶剂或消泡剂，因此图案的边缘。

    Combination development unit and toner level detection service
    7.
    发明授权
    Combination development unit and toner level detection service 失效
    组合开发单元和墨粉量检测服务

    公开(公告)号：US5893007A

    公开(公告)日：1999-04-06

    申请号：US984072

    申请日：1997-12-03

    申请人： Young-Taek Lim

    发明人： Young-Taek Lim

    IPC分类号： G03G15/08 ,  G03G15/00

    CPC分类号： G03G15/0896 ,  G03G15/0856

    摘要： A combination developer unit and toner level detection device increases the efficiency of manufacturing an electrophotographic apparatus and correspondingly lowers the cost of production. This device employs a spring biased actuator in combination with a magnet and optical sensors to provide the functions of two detection devices in a single detection device.

    摘要翻译： 组合显影单元和调色剂水平检测装置提高了电子照相设备的制造效率，并且相应地降低了生产成本。 该装置采用与磁体和光学传感器组合的弹簧偏置致动器，以在单个检测装置中提供两个检测装置的功能。