Invention Grant
- Patent Title: Memory device having molecular adsorption layer
- Patent Title (中): 具有分子吸附层的记忆装置
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Application No.: US11221864Application Date: 2005-09-09
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Publication No.: US07332740B2Publication Date: 2008-02-19
- Inventor: Noe-jung Park , Kwang-hee Kim , Dong-hun Kang , Jae-woong Hyun , Ki-ha Hong
- Applicant: Noe-jung Park , Kwang-hee Kim , Dong-hun Kang , Jae-woong Hyun , Ki-ha Hong
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: KR10-2004-0088916 20041103
- Main IPC: H01L35/24
- IPC: H01L35/24 ; H01L51/00

Abstract:
Provided is a memory device comprising a molecular adsorption layer. The memory device includes: a substrate; a source electrode and a drain electrode formed on the substrate and separated from each other; a carbon nanotube (CNT) layer electrically connected to the source electrode and the drain electrode; a memory cell contacting the CNT so as to store a charge from the CNT; and a gate electrode formed on the memory cell, wherein the memory cell comprises: a first insulating layer formed on the CNT; a molecular adsorption layer which is formed on the first insulating layer and acts as a charge storage layer; and a second insulating layer formed on the molecular adsorption layer.
Public/Granted literature
- US20060091440A1 Memory device having molecular adsorption layer Public/Granted day:2006-05-04
Information query
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