Invention Grant
US07338742B2 Photoresist polymer and photoresist composition containing the same
失效
光致抗蚀剂聚合物和含有它的光致抗蚀剂组合物
- Patent Title: Photoresist polymer and photoresist composition containing the same
- Patent Title (中): 光致抗蚀剂聚合物和含有它的光致抗蚀剂组合物
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Application No.: US10876029Application Date: 2004-06-24
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Publication No.: US07338742B2Publication Date: 2008-03-04
- Inventor: Geun Su Lee
- Applicant: Geun Su Lee
- Applicant Address: KR Kyungki-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Kyungki-do
- Agency: Marshall, Gerstein & Borun LLP
- Priority: KR10-2003-0069898 20031008; KR10-2003-0094610 20031222
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/32
Abstract:
The present invention relates to photoresist polymers and photoresist compositions. The disclosed photoresist polymers and photoresist compositions containing the same have excellent transmittance, etching resistance, thermal resistance and adhesive property, low light absorbance and high affinity to a developing solution at a wavelength of 193 nm and 157 nm, thereby improving LER (line edge roughness).
Public/Granted literature
- US20050089800A1 Photoresist polymer and photoresist composition containing the same Public/Granted day:2005-04-28
Information query
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