发明授权
US07341782B2 Polymer composition containing organic modified layered silicate, film and gas barrier film as well as substrate and image display device using them 失效
含有有机改性层状硅酸盐,膜和阻气膜的聚合物组合物以及使用它们的底物和图像显示装置

  • 专利标题: Polymer composition containing organic modified layered silicate, film and gas barrier film as well as substrate and image display device using them
  • 专利标题(中): 含有有机改性层状硅酸盐,膜和阻气膜的聚合物组合物以及使用它们的底物和图像显示装置
  • 申请号: US10665432
    申请日: 2003-09-22
  • 公开(公告)号: US07341782B2
    公开(公告)日: 2008-03-11
  • 发明人: Hideaki NaruseTaisei Nishimi
  • 申请人: Hideaki NaruseTaisei Nishimi
  • 申请人地址: JP Tokyo
  • 专利权人: FUJIFILM Corporation
  • 当前专利权人: FUJIFILM Corporation
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Sughrue Mion, PLLC
  • 优先权: JP2002-274037 20020919
  • 主分类号: H01J1/62
  • IPC分类号: H01J1/62 C09K9/04 B32B9/04
Polymer composition containing organic modified layered silicate, film and gas barrier film as well as substrate and image display device using them
摘要:
A polymer composition includes a polymer having a glass transition temperature of 120° C. to 400° C. as a simple substance of the polymer and an organic modified layered silicate having a decomposition starting temperature of 190° C. to 350° C. and contained in the polymer. (1) A film including the polymer composition, (2) a gas barrier film including the film and an organic/inorganic hybrid layer obtained by the sol-gel method and provided on the film, (3) a substrate comprising the film or the gas barrier film, and (4) an image display device comprising at least an anode, a light-emitting organic thin film layer and a cathode on the film or the gas barrier film are also disclosed. A polymer composition having both superior heat resistance and superior gas baffler properties, a film comprising the polymer composition, and a gas baffler film having the film, as well as a substrate and image display device exhibiting superior precision and durability are provided.
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