发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10964816申请日： 2004-10-15
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公开(公告)号： US07352435B2公开(公告)日： 2008-04-01
- 发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
- 申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
- 申请人地址： NL Veldhoven DE Oberkochen
- 专利权人： ASML Netherlands B.V.,Carl Zeiss SMT AG
- 当前专利权人： ASML Netherlands B.V.,Carl Zeiss SMT AG
- 当前专利权人地址： NL Veldhoven DE Oberkochen
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 优先权： EP03256498 20031015
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/52
摘要：
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
公开/授权文献
- US20050174550A1 Lithographic apparatus and device manufacturing method 公开/授权日：2005-08-11
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