发明授权
- 专利标题: Substrate holding and rotating apparatus
- 专利标题(中): 基板保持和旋转装置
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申请号: US11197210申请日: 2005-08-03
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公开(公告)号: US07354481B2公开(公告)日: 2008-04-08
- 发明人: Eiji Okuno , Takeshi Yoshida
- 申请人: Eiji Okuno , Takeshi Yoshida
- 申请人地址: JP
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JP
- 代理机构: Ostrolenk, Faber, Gerb & Soffen, LLP
- 优先权: JP2004-267332 20040914
- 主分类号: B05C13/00
- IPC分类号: B05C13/00
摘要:
A substrate holding and rotating apparatus includes: a spin base connected to a rotary shaft and rotatable therearound; holding members attached to the spin base and displaceable between holding positions at which the holding members come in contact with the peripheral edge of the substrate such that the holding members are capable of holding the substrate, and retreat positions at which the holding members are retreated from the holding positions; a holding members drive mechanism for driving the holding members between the holding positions and the retreat positions; and a rotation regulating mechanism arranged to be brought, in association with the operation of the holding-member drive mechanism, into a rotation allowing state where the spin base is allowed to be rotated and into a rotation regulating state where the rotation of the spin base is regulated.
公开/授权文献
- US20060054082A1 Substrate holding and rotating apparatus 公开/授权日:2006-03-16