公开(公告)号：US08157496B2

公开(公告)日：2012-04-17

申请号：US11469700

申请日：2006-09-01

申请人： Eiji Okuno ,  Takashi Hara

发明人： Eiji Okuno ,  Takashi Hara

IPC分类号： B65G1/00

CPC分类号： H01L21/67766 ,  H01L21/67167 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S414/137

摘要： A substrate processing apparatus includes a cassette placing table; a first transfer mechanism having a first substrate holding hand capable of advancing/retreating and using this first substrate holding hand to transfer a substrate with respect to the cassette; a substrate processing unit for executing a predetermined process on a substrate; a second transfer mechanism having a second substrate holding hand capable of advancing/retreating and pivotable at a vertical axis, and using the second substrate holding hand to transfer a substrate with respect to the first transfer mechanism and the substrate processing unit; a moving mechanism for moving the first transfer mechanism in an arrangement direction of the cassettes; and a control unit for controlling transfer of a substrate between the first transfer mechanism and the second transfer mechanism in a position where the first transfer mechanism is opposed to a cassette.

摘要翻译： 基板处理装置包括：盒放置台; 第一传送机构具有能够前进/后退的第一基板保持手，并且使用该第一基板握持器相对于盒传送基板; 用于在衬底上执行预定处理的衬底处理单元; 第二传送机构，具有能够在垂直轴上前进/后退并且可枢转的第二基板保持手，并且使用第二基板握持手相对于第一传送机构和基板处理单元传送基板; 移动机构，用于沿着所述盒的排列方向移动所述第一传送机构; 以及控制单元，用于控制第一传送机构和第二传送机构之间的基板在第一传送机构与盒相对的位置的传送。

公开(公告)号：US07407363B2

公开(公告)日：2008-08-05

申请号：US11391767

申请日：2006-03-24

申请人： Eiji Okuno

发明人： Eiji Okuno

IPC分类号： B65G35/00

CPC分类号： H01L21/67742

摘要： A substrate transport apparatus includes a first substrate transport robot, a second substrate transport robot and a substrate transfer mechanism. The first substrate transport robot includes an upper hand and a lower hand vertically arranged. The second substrate transport robot includes an upper hand and a lower hand vertically arranged. The substrate transfer mechanism includes an upper hand and a lower hand vertically arranged and a hand driving mechanism adapted to perform hand opening and closing operations to vertically move the upper and lower hands.

摘要翻译： 基板输送装置包括第一基板输送机器人，第二基板输送机器人和基板输送机构。 第一基板输送机器人包括上手和下手布置的下手。 第二基板输送机器人包括上下手和下手。 基板传送机构包括上部手和下部垂直布置的手柄，以及适用于执行手动打开和关闭操作以垂直移动上下手的手动驱动机构。

公开(公告)号：US07354481B2

公开(公告)日：2008-04-08

申请号：US11197210

申请日：2005-08-03

申请人： Eiji Okuno ,  Takeshi Yoshida

发明人： Eiji Okuno ,  Takeshi Yoshida

IPC分类号： B05C13/00

CPC分类号： H01L21/68728 ,  H01L21/68778 ,  H01L21/68785 ,  H01L21/68792 ,  Y10S134/902 ,  Y10T279/17231 ,  Y10T279/18

摘要： A substrate holding and rotating apparatus includes: a spin base connected to a rotary shaft and rotatable therearound; holding members attached to the spin base and displaceable between holding positions at which the holding members come in contact with the peripheral edge of the substrate such that the holding members are capable of holding the substrate, and retreat positions at which the holding members are retreated from the holding positions; a holding members drive mechanism for driving the holding members between the holding positions and the retreat positions; and a rotation regulating mechanism arranged to be brought, in association with the operation of the holding-member drive mechanism, into a rotation allowing state where the spin base is allowed to be rotated and into a rotation regulating state where the rotation of the spin base is regulated.

摘要翻译： 基板保持旋转装置包括：旋转基座，其连接到旋转轴并可绕其旋转; 保持构件附接到旋转基座，并且能够在保持构件与基板的周缘接触的保持位置之间移位，使得保持构件能够保持基板，并且将保持构件从后退的位置 担任职位; 保持构件驱动机构，用于在保持位置和退避位置之间驱动保持构件; 以及旋转调节机构，其被配置成与保持构件驱动机构的操作相关联地转动到允许旋转基座旋转的旋转允许状态，并且转动到旋转调节状态，旋转基座 受到管制

公开(公告)号：US20060245853A1

公开(公告)日：2006-11-02

申请号：US11391767

申请日：2006-03-24

申请人： Eiji Okuno

发明人： Eiji Okuno

IPC分类号： H01L21/677

CPC分类号： H01L21/67742

摘要： A substrate transport apparatus includes a first substrate transport robot, a second substrate transport robot and a substrate transfer mechanism. The first substrate transport robot includes an upper hand and a lower hand vertically arranged. The second substrate transport robot includes an upper hand and a lower hand vertically arranged. The substrate transfer mechanism includes an upper hand and a lower hand vertically arranged and a hand driving mechanism adapted to perform hand opening and closing operations to vertically move the upper and lower hands.

摘要翻译： 基板输送装置包括第一基板输送机器人，第二基板输送机器人和基板输送机构。 第一基板输送机器人包括上手和下手布置的下手。 第二基板输送机器人包括上下手和下手。 基板传送机构包括上部手和下部垂直布置的手柄，以及适用于执行手动打开和关闭操作以垂直移动上下手的手动驱动机构。

公开(公告)号：US20060081274A1

公开(公告)日：2006-04-20

申请号：US11248056

申请日：2005-10-11

申请人： Eiji Okuno

发明人： Eiji Okuno

IPC分类号： B08B3/02

CPC分类号： H01L21/68778 ,  H01L21/67051 ,  H01L21/68792

摘要： A substrate holding device according to the present invention comprises: a motor; a rotating shaft rotated by the driving force of the motor; a spin base coupled to the rotating shaft and rotated integrally with the rotating shaft; a cover member surrounding the motor and having its one end arranged in the vicinity of the spin base; a rotating ring fixed to a surface, opposite to the cover member, of the spin base; a fixed ring arranged opposite to the rotating ring along the axis of the rotating shaft; a spring provided at the one end of the cover member for elastically urging the fixed ring toward the rotating ring; and clean gas supply mechanism for supplying clean gas to a space between the rotating ring and the fixed ring. Either one of a surface, opposite to the fixed ring, of the rotating ring and a surface, opposite to the rotating ring, of the fixed ring is formed with a gas introducing recess into which the clean gas is to be introduced by the clean gas supply mechanism, and either one of the opposite surfaces being formed with a dynamic pressure creating recess for creating the dynamic pressure of the gas between the rotating ring and the fixed ring when the rotating ring rotates.

公开(公告)号：US07513263B2

公开(公告)日：2009-04-07

申请号：US11248056

申请日：2005-10-11

申请人： Eiji Okuno

发明人： Eiji Okuno

IPC分类号： B08B3/04

CPC分类号： H01L21/68778 ,  H01L21/67051 ,  H01L21/68792

摘要： A substrate holding device according to the present invention comprises: a motor; a rotating shaft rotated by the driving force of the motor; a spin base coupled to the rotating shaft and rotated integrally with the rotating shaft; a cover member surrounding the motor and having its one end arranged in the vicinity of the spin base; a rotating ring fixed to a surface, opposite to the cover member, of the spin base; a fixed ring arranged opposite to the rotating ring along the axis of the rotating shaft; a spring provided at the one end of the cover member for elastically urging the fixed ring toward the rotating ring; and clean gas supply mechanism for supplying clean gas to a space between the rotating ring and the fixed ring. Either one of a surface, opposite to the fixed ring, of the rotating ring and a surface, opposite to the rotating ring, of the fixed ring is formed with a gas introducing recess into which the clean gas is to be introduced by the clean gas supply mechanism, and either one of the opposite surfaces being formed with a dynamic pressure creating recess for creating the dynamic pressure of the gas between the rotating ring and the fixed ring when the rotating ring rotates.

摘要翻译： 根据本发明的基板保持装置包括：马达; 旋转轴由电动机的驱动力旋转; 旋转基座，其联接到所述旋转轴并与所述旋转轴一体地旋转; 围绕电动机并且其一端布置在旋转基座附近的盖构件; 旋转环固定到旋转基体的与盖构件相对的表面; 固定环，其沿着所述旋转轴的轴线与所述旋转环相对布置; 设置在所述盖构件的一端的弹簧，用于朝向所述旋转环弹性地推压所述固定环; 以及用于将清洁气体供应到旋转环和固定环之间的空间的清洁气体供给机构。 固定环的与固定环相对的表面中的任一个与旋转环相反的表面形成有气体引入凹部，清洁气体将被清洁气体引入到该气体引入凹槽中 供给机构，并且任一个相对表面形成有动压产生凹部，用于当旋转环旋转时在旋转环和固定环之间产生气体的动态压力。

公开(公告)号：US20090053020A1

公开(公告)日：2009-02-26

申请号：US12194880

申请日：2008-08-20

申请人： Eiji Okuno

发明人： Eiji Okuno

IPC分类号： H01L21/68

CPC分类号： H01L21/67745 ,  H01L21/67196

摘要： An indexer robot includes first and second substrate holding mechanisms, first and second lifting/lowering mechanisms, a rotation mechanism and a moving mechanism. The first and second substrate holding mechanisms have arms and hands and provided on the first and second lifting/lowering mechanisms, respectively. The first and second lifting/lowering mechanisms can lift the first and second substrate holding mechanisms independently from each other. The first and second lifting/lowering mechanisms are provided on the rotation mechanism. The rotation mechanism is provided on the moving mechanism.

摘要翻译： 分度器机器人包括第一和第二基板保持机构，第一和第二提升/下降机构，旋转机构和移动机构。 第一和第二基板保持机构分别具有臂和手并设置在第一和第二升降机构上。 第一和第二提升/降低机构可以彼此独立地提升第一和第二基板保持机构。 第一和第二提升/下降机构设置在旋转机构上。 旋转机构设置在移动机构上。

公开(公告)号：US20070081881A1

公开(公告)日：2007-04-12

申请号：US11469700

申请日：2006-09-01

申请人： Eiji Okuno ,  Takashi Hara

发明人： Eiji Okuno ,  Takashi Hara

IPC分类号： H01L21/677

CPC分类号： H01L21/67766 ,  H01L21/67167 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S414/137

摘要： A substrate processing apparatus includes a cassette placing table; a first transfer mechanism having a first substrate holding hand capable of advancing/retreating and using this first substrate holding hand to transfer a substrate with respect to the cassette; a substrate processing unit for executing a predetermined process on a substrate; a second transfer mechanism having a second substrate holding hand capable of advancing/retreating and pivotable at a vertical axis, and using the second substrate holding hand to transfer a substrate with respect to the first transfer mechanism and the substrate processing unit; a moving mechanism for moving the first transfer mechanism in an arrangement direction of the cassettes; and a control unit for controlling transfer of a substrate between the first transfer mechanism and the second transfer mechanism in a position where the first transfer mechanism is opposed to a cassette.

摘要翻译： 基板处理装置包括：盒放置台; 第一传送机构具有能够前进/后退的第一基板保持手，并且使用该第一基板握持器相对于盒传送基板; 用于在衬底上执行预定处理的衬底处理单元; 第二传送机构，具有能够在垂直轴上前进/后退并且可枢转的第二基板保持手，并且使用第二基板握持器相对于第一传送机构和基板处理单元传送基板; 移动机构，用于沿着所述盒的排列方向移动所述第一传送机构; 以及控制单元，用于控制第一传送机构和第二传送机构之间的基板在第一传送机构与盒相对的位置的传送。

公开(公告)号：US20060054082A1

公开(公告)日：2006-03-16

申请号：US11197210

申请日：2005-08-03

申请人： Eiji Okuno ,  Takeshi Yoshida

发明人： Eiji Okuno ,  Takeshi Yoshida

IPC分类号： C23C14/00 ,  B05C13/00 ,  B05C21/00

CPC分类号： H01L21/68728 ,  H01L21/68778 ,  H01L21/68785 ,  H01L21/68792 ,  Y10S134/902 ,  Y10T279/17231 ,  Y10T279/18

摘要： A substrate holding and rotating apparatus includes: a spin base connected to a rotary shaft and rotatable therearound; holding members attached to the spin base and displaceable between holding positions at which the holding members come in contact with the peripheral edge of the substrate such that the holding members are capable of holding the substrate, and retreat positions at which the holding members are retreated from the holding positions; a holding members drive mechanism for driving the holding members between the holding positions and the retreat positions; and a rotation regulating mechanism arranged to be brought, in association with the operation of the holding-member drive mechanism, into a rotation allowing state where the spin base is allowed to be rotated and into a rotation regulating state where the rotation of the spin base is regulated.

摘要翻译： 基板保持旋转装置包括：旋转基座，其连接到旋转轴并可绕其旋转; 保持构件附接到旋转基座，并且能够在保持构件与基板的周缘接触的保持位置之间移动，使得保持构件能够保持基板，并且保持构件从后退的位置 担任职位; 保持构件驱动机构，用于在保持位置和退避位置之间驱动保持构件; 以及旋转调节机构，其被配置成与保持构件驱动机构的操作相关联地转动到允许旋转基座旋转的旋转允许状态，并且转动到旋转调节状态，旋转基座 受到管制