Invention Grant
US07358159B2 Method for manufacturing ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device
失效
制造ZnTe化合物半导体单晶ZnTe化合物半导体单晶的方法及半导体器件
- Patent Title: Method for manufacturing ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device
- Patent Title (中): 制造ZnTe化合物半导体单晶ZnTe化合物半导体单晶的方法及半导体器件
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Application No.: US10472446Application Date: 2002-03-20
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Publication No.: US07358159B2Publication Date: 2008-04-15
- Inventor: Tetsuya Yamamoto , Atsutoshi Arakawa , Kenji Sato , Toshiaki Asahi
- Applicant: Tetsuya Yamamoto , Atsutoshi Arakawa , Kenji Sato , Toshiaki Asahi
- Applicant Address: JP Tokyo
- Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2001-106295 20010404; JP2001-204419 20010705; JP2001-330193 20011029; JP2001-330194 20011029
- International Application: PCT/JP02/02642 WO 20020320
- International Announcement: WO02/081789 WO 20021017
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
The present invention relates to a method for producing an n-type ZnTe system compound semiconductor single crystal having high carrier concentration and low resistivity, the ZnTe system compound semiconductor single crystal, and a semiconductor device produced by using the ZnTe system compound semiconductor as a base member. Concretely, a first dopant and a second dopant are co-doped into the ZnTe system compound semiconductor single crystal so that the number of atoms of the second dopant becomes smaller than the number of atoms of the first dopant, the first dopant being for controlling a conductivity type of the ZnTe system compound semiconductor to a first conductivity type, and the second dopant being for controlling the conductivity type to a second conductivity type different from the first conductivity type. By the present invention, a desired carrier concentration can be achieved with a doping amount smaller than in earlier technology, and crystallinity of the obtained crystal can be improved.
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