Invention Grant
- Patent Title: Method for temperature control in a rapid thermal processing system
- Patent Title (中): 快速热处理系统中的温度控制方法
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Application No.: US10969475Application Date: 2004-10-20
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Publication No.: US07368303B2Publication Date: 2008-05-06
- Inventor: Wei-Ming You , Shi-Ming Wang , Cheng Wei Chen , Jian-Hua Huang , Yu-Lin Du
- Applicant: Wei-Ming You , Shi-Ming Wang , Cheng Wei Chen , Jian-Hua Huang , Yu-Lin Du
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Baker & McKenzie LLP
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66

Abstract:
A method is disclosed for a multi-zone interference correction processing for a rapid thermal processing (RTP) system. This processing allows for improved calibration/tuning of RTP systems by accounting for zone coupling. The disclosed method includes establishing baseline characteristic data and zone characteristic data, and then using the baseline and zone characteristic data to determine lamp-control parameters, such as temperature offset values, for temperature sensors of the RTP system. The baseline characteristic data includes information regarding baseline heating uniformity of an RTP system. The zone characteristic data is collected for a plurality of heating zones within the heating chamber of the RTP system, each zone being associated with a respective temperature probe. The zone characteristic data is collected based on controlled temperature sensor variations. The lamp-control parameters for temperature probes of the RTP system are then calculated based on the baseline characteristic data and the zone characteristic data.
Public/Granted literature
- US20060084188A1 Method for temperature control in a rapid thermal processing system Public/Granted day:2006-04-20
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