发明授权
- 专利标题： Process for manufacturing liquid ejection head
- 专利标题（中）： 液体喷射头的制造方法
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申请号： US11298187申请日： 2005-12-09
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公开(公告)号： US07371591B2公开(公告)日： 2008-05-13
- 发明人: Shogo Ono
- 申请人： Shogo Ono
- 申请人地址： JP Tokyo
- 专利权人： Sony Corporation
- 当前专利权人： Sony Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Rockey, Depke & Lyons, LLC.
- 代理商 Robert J. Depke
- 优先权： JPP2004-369933 20041221
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A process includes forming a protective layer in a region of a substrate including a PAD electrode; forming a soluble resin layer in a region including a region on the substrate where an energy generating element has been formed, for forming a liquid chamber; forming a coating resin layer in a region covering the soluble resin layer and a region where an opening is formed above the electrode; forming an opening in the coating resin layer above the energy generating element to form a nozzle; dipping the substrate in an dissolving liquid to dissolve the soluble resin layer; and removing the protective layer after dissolution of the soluble resin layer.
公开/授权文献
- US20060134896A1 Process for manufacturing liquid ejection head 公开/授权日：2006-06-22
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