Invention Grant
- Patent Title: Method of calibrating or qualifying a lithographic apparatus or part thereof, and device manufacturing method
- Patent Title (中): 校准或限定光刻设备或其一部分的方法，以及器件制造方法
-
Application No.: US11177491Application Date: 2005-07-11
-
Publication No.: US07374957B2Publication Date: 2008-05-20
- Inventor: Rene Oesterholt
- Applicant: Rene Oesterholt
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01R31/26
- IPC: G01R31/26
Abstract:
A system and method are provided for qualifying or calibrating lithographic apparatus or parts therefor, using a predetermined objective criterion such as Chauvenet's criterion is used to reject measurement points, individually, by field or by substrate.
Public/Granted literature
Information query
