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US07384662B2 Through structure of connecting line at gastight chamber, and ejection system incorporating same; method of manufacturing LCD device, organic EL device, electron emitting device, PDP device, electrophoresis display device, color filter, and organic EL; and method of forming spacer, metal wiring, lens, resist, and light diffuser 失效
气密室连接线结构及其结合的喷射系统; 制造LCD器件的方法，有机EL器件，电子发射器件，PDP器件，电泳显示器件，滤色器和有机EL; 以及形成间隔物，金属布线，透镜，抗蚀剂和光扩散器的方法

  • 专利标题： Through structure of connecting line at gastight chamber, and ejection system incorporating same; method of manufacturing LCD device, organic EL device, electron emitting device, PDP device, electrophoresis display device, color filter, and organic EL; and method of forming spacer, metal wiring, lens, resist, and light diffuser
  • 专利标题（中）： 气密室连接线结构及其结合的喷射系统; 制造LCD器件的方法，有机EL器件，电子发射器件，PDP器件，电泳显示器件，滤色器和有机EL; 以及形成间隔物，金属布线，透镜，抗蚀剂和光扩散器的方法
  • 申请号： US10367719
    申请日： 2003-02-19
  • 公开(公告)号： US07384662B2
    公开(公告)日： 2008-06-10
  • 发明人: Yutaka Takano , Shinichi Nakamura
  • 申请人： Yutaka Takano , Shinichi Nakamura
  • 申请人地址： JP Tokyo
  • 专利权人： Seiko Epson Corporation
  • 当前专利权人： Seiko Epson Corporation
  • 当前专利权人地址： JP Tokyo
  • 代理机构： Oliff & Berridge, PLC
  • 优先权： JP2002-072676 20020315
  • 主分类号： B05D5/06
  • IPC分类号： B05D5/06 ;  B05D5/12 ;  C23C14/00 ;  B05B3/00 ;  B05C13/02 ;  F16L5/02
Through structure of connecting line at gastight chamber, and ejection system incorporating same; method of manufacturing LCD device, organic EL device, electron emitting device, PDP device, electrophoresis display device, color filter, and organic EL; and method of forming spacer, metal wiring, lens, resist, and light diffuser
摘要：
There is provided a through structure of connecting lines extending through a wall of a gastight chamber. The through structure of the connecting lines is capable of positively sealing between the wall and the connecting lines extending therethrough. The through structure enables the connecting lines to extend through the wall of the gastight chamber for connecting a work processing apparatus contained in the gastight chamber and accessories for the work processing apparatus. The through structure comprises a through sleeve extending through the wall, with the connecting lines extending therethrough, a first seal member filled in the through sleeve for sealing between the through sleeve and the connecting lines, and a second seal member for sealing between the through sleeve and the wall.
摘要（中）：

提供了通过气密室的壁延伸的连接线的贯穿结构。 连接线的贯穿结构能够在壁和延伸穿过其的连接线之间积极地密封。 通孔结构使得连接线能够延伸通过气密室的壁，用于连接包含在气密室中的工作处理装置和用于工作处理装置的附件。 所述贯穿结构包括穿过所述壁延伸的穿过套筒，所述连接线延伸穿过所述套筒，所述穿过套筒填充在所述穿过套筒中以密封所述穿过套筒和所述连接线之间的第一密封件，以及用于密封所述穿套筒 和墙。

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