发明授权
- 专利标题： Method for fabricating optical devices in photonic crystal structures
- 专利标题（中）： 在光子晶体结构中制造光器件的方法
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申请号： US10525763申请日： 2003-08-26
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公开(公告)号： US07384724B2公开(公告)日： 2008-06-10
- 发明人: Janusz Murakowski , Dennis W. Prather
- 申请人： Janusz Murakowski , Dennis W. Prather
- 申请人地址： US DE Newark
- 专利权人： University of Delaware
- 当前专利权人： University of Delaware
- 当前专利权人地址： US DE Newark
- 代理机构： Ratner Prestia
- 国际申请： PCT/US03/26499 WO 20030826
- 国际公布： WO2004/019080 WO 20040304
- 主分类号： G03C5/00
- IPC分类号： G03C5/00 ; G03H1/02
摘要：
A method for manufacturing optical components in a three-dimensional photonic crystal lattice. A first resist (9) is coated on a substrate (10) and exposed to an e-beam (11), to produce an imaged area (12). Another resist coating is applied to thicken the resist (13) and an interference exposure (15) is used to image the result. This is developed to form periodic voids (16), which may be filled with a materials having a high refractive index to form a pattern (18 and 12) when the resist (13) is removed.
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