发明授权
US07387952B2 Semiconductor substrate for solid-state image pickup device and producing method therefor 有权
用于固态图像拾取装置的半导体衬底及其制造方法

Semiconductor substrate for solid-state image pickup device and producing method therefor
摘要:
A semiconductor substrate for forming a pixel area provided surfacially with a plurality of pixels for photoelectric conversion, the semiconductor substrate, including a polysilicon film of a thickness of 0.5-2.0, on a rear surface of the pixel area-bearing surface, and having an oxygen concentration of 1.3-1.5E+18 atom/cm3 (old ASTM).
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