发明授权
US07391495B2 Stage apparatus, exposure system using the same, and device manufacturing method
失效
舞台装置，使用其的曝光系统和装置制造方法
- 专利标题： Stage apparatus, exposure system using the same, and device manufacturing method
- 专利标题（中）： 舞台装置，使用其的曝光系统和装置制造方法
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申请号： US10820120申请日： 2004-04-08
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公开(公告)号： US07391495B2公开(公告)日： 2008-06-24
- 发明人: Yoshikazu Miyajima , Yasuhito Sasaki , Hitoshi Sato
- 申请人： Yoshikazu Miyajima , Yasuhito Sasaki , Hitoshi Sato
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2003-128183 20030506
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
A stage apparatus includes a base having a reference surface, a moving unit which moves along the reference surface, a static bearing which is provided in the moving unit and which supports the moving unit such that the moving unit can move along the reference surface, and a temperature controller which is provided in the moving unit and which controls the temperature of gas supplied to the static bearing. In the stage apparatus, air fluctuation in the measurement area of interferometers due to gas exhausted from the static bearing and/or distortion caused by heat transmitted to a retainer of a target is suppressed, and the stage positioning accuracy is thereby increased.