Invention Grant
- Patent Title: Method of manufacturing an inductance
- Patent Title (中): 制造电感的方法
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Application No.: US10268648Application Date: 2002-10-10
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Publication No.: US07404249B2Publication Date: 2008-07-29
- Inventor: Pascal Gardes , Gérard Auriel
- Applicant: Pascal Gardes , Gérard Auriel
- Applicant Address: FR Montrouge
- Assignee: STMicroelectronics S.A.
- Current Assignee: STMicroelectronics S.A.
- Current Assignee Address: FR Montrouge
- Agency: Wolf, Greenfield & Sacks, P.C.
- Agent Lisa K. Jorgenson; James H. Morris
- Priority: FR0113055 20011010
- Main IPC: H01F7/06
- IPC: H01F7/06
Abstract:
A method for manufacturing an inductance in a monolithic circuit including a substrate of planar upper surface, including the steps of forming in the substrate a cavity substantially following the contour of the inductance to be formed, the cross-section of the cavity being deep with respect to its width; and filling the cavity with a conductive material.
Public/Granted literature
- US20030066184A1 Inductance and its manufacturing method Public/Granted day:2003-04-10
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