发明授权
- 专利标题: Processing method, processing apparatus, crystallization method and crystallization apparatus using pulsed laser beam
- 专利标题(中): 处理方法,处理装置,结晶方法和使用脉冲激光束的结晶装置
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申请号: US11679724申请日: 2007-02-27
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公开(公告)号: US07405141B2公开(公告)日: 2008-07-29
- 发明人: Masayuki Jyumonji , Hiroyuki Ogawa , Masato Hiramatsu , Noritaka Akita , Tomoya Kato
- 申请人: Masayuki Jyumonji , Hiroyuki Ogawa , Masato Hiramatsu , Noritaka Akita , Tomoya Kato
- 申请人地址: JP Yokohama-shi
- 专利权人: Advanced LCD Technologies Development Center Co., Ltd.
- 当前专利权人: Advanced LCD Technologies Development Center Co., Ltd.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2004-299222 20041013; JP2005-275866 20050922
- 主分类号: H01L21/268
- IPC分类号: H01L21/268
摘要:
In a laser processing method and a laser processing apparatus which irradiate a processing target body with a laser beam pulse-oscillated from a laser beam source, a processing state is monitored by a photodetector, and the laser beam source is again subjected to oscillation control on the moment when erroneous laser irradiation is detected, thereby performing laser processing. Further, in a laser crystallization method and a laser crystallization apparatus using a pulse-oscillated excimer laser, a homogenizing optical system, an optical element and a half mirror are arranged in an optical path, light from the half mirror is detected by a photodetector, and a light intensity insufficient irradiation position is again irradiated with a laser beam to perform crystallization when the detection value does not fall within a range of a predetermined specified value.