发明授权
- 专利标题： Lithographic apparatus and substrate edge seal
- 专利标题（中）： 平版印刷设备和基板边缘密封
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申请号： US11317259申请日： 2005-12-27
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公开(公告)号： US07420194B2公开(公告)日： 2008-09-02
- 发明人: Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
- 申请人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
公开/授权文献
- US20070146665A1 Lithographic apparatus and substrate edge seal 公开/授权日：2007-06-28