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公开(公告)号：US07420194B2
公开(公告)日：2008-09-02
申请号：US11317259
申请日：2005-12-27
申请人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
发明人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
摘要翻译： 公开了一种有助于防止液体到达衬底的方法，其包括在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液，有助于保持存在于顶部的浸没液体，以及 衬底的边缘远离衬底的底表面。
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公开(公告)号：US07751027B2
公开(公告)日：2010-07-06
申请号：US11454129
申请日：2006-06-16
申请人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
发明人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
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公开(公告)号：US08232540B2
公开(公告)日：2012-07-31
申请号：US13184152
申请日：2011-07-15
申请人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
发明人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
CPC分类号： G03F7/70341
摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
摘要翻译： 公开了一种有助于防止液体到达衬底的方法，其包括在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液，有助于保持存在于顶部的浸没液体，以及 衬底的边缘远离衬底的底表面。
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公开(公告)号：US20080284995A1
公开(公告)日：2008-11-20
申请号：US12219606
申请日：2008-07-24
申请人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
发明人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
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5.发明授权Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder 有权具有具有流体的热管以冷却衬底和/或衬底保持器的光刻设备和器件制造方法公开(公告)号：US09268236B2
公开(公告)日：2016-02-23
申请号：US12814242
申请日：2010-06-11
申请人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
发明人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.
摘要翻译： 一种光刻设备，其被配置为将图案化的辐射束投影到保持在基板台上的凹槽中的基板保持器上的基板的目标部分上，该设备包括：液体供应系统，其构造成至少部分地填充投影系统和 液体基体; 阻挡结构，其构造成在所述空间内基本上容纳所述液体; 以及在使用中供应有温度调节的流体并被配置为在可能发生局部冷却的位置处对基板和/或基板保持器进行热调节的热管。
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公开(公告)号：US08003968B2
公开(公告)日：2011-08-23
申请号：US12219606
申请日：2008-07-24
申请人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
发明人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
CPC分类号： G03F7/70341
摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
摘要翻译： 公开了一种有助于防止液体到达衬底的方法，其包括在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液，有助于保持存在于顶部的浸没液体，以及 衬底的边缘远离衬底的底表面。
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公开(公告)号：US20100245791A1
公开(公告)日：2010-09-30
申请号：US12814242
申请日：2010-06-11
申请人： Johannes Henricus Wilhelmus JACOBS , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Fraciscus Johannes Joseph Janssen
发明人： Johannes Henricus Wilhelmus JACOBS , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Fraciscus Johannes Joseph Janssen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
摘要翻译： 使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。 从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。
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公开(公告)号：US08416395B2
公开(公告)日：2013-04-09
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
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公开(公告)号：US20090279061A1
公开(公告)日：2009-11-12
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus JACOBS , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus JACOBS , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。
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公开(公告)号：US08564763B2
公开(公告)日：2013-10-22
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。
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