发明授权
- 专利标题: Photosensitive material processor
- 专利标题(中): 感光材料处理器
-
申请号: US11193622申请日: 2005-08-01
-
公开(公告)号: US07422383B2公开(公告)日: 2008-09-09
- 发明人: Ryoei Nozawa , Hideto Yamamoto , Toshihiro Suya , Daisuke Hibe , Keiichi Adachi
- 申请人: Ryoei Nozawa , Hideto Yamamoto , Toshihiro Suya , Daisuke Hibe , Keiichi Adachi
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2004-224347 20040730
- 主分类号: G03D3/02
- IPC分类号: G03D3/02 ; G03D3/08
摘要:
Developer is supplied to a first spray pipe disposed in a developing bath. The inside of the developing bath is provided with a heater. A liquid-flow generating unit comprises a liquid-flow generating head and a branch duct, which is connected to a branch pipe of the first spray pipe via a rubber hose. A part of the developer flowing in the first spray pipe is forwarded to the liquid-flow generating head. By a gap-forming ring, a gap is secured between an outer surface of the heater and an inner surface of the liquid-flow generating head so that the developer uniformly flows along the outer surface of the heater in a longitudinal direction thereof. A heater cover is attached to the liquid-flow generating head. An inner surface of the heater cover inclines in the longitudinal direction of the heater.
公开/授权文献
- US20060056841A1 Photosensitive material processor 公开/授权日:2006-03-16
信息查询