发明授权
- 专利标题： Method and apparatus for film deposition
- 专利标题（中）： 薄膜沉积的方法和装置
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申请号： US10081971申请日： 2002-02-20
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公开(公告)号： US07432116B2公开(公告)日： 2008-10-07
- 发明人: Shunpei Yamazaki , Satoshi Seo , Noriko Shibata
- 申请人： Shunpei Yamazaki , Satoshi Seo , Noriko Shibata
- 申请人地址： JP Atsugi-shi, Kanagawa-ken
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JP Atsugi-shi, Kanagawa-ken
- 代理机构： Fish & Richardson P.C.
- 优先权： JP2001-044650 20010221
- 主分类号： H01L21/20
- IPC分类号： H01L21/20
摘要：
Provided is a method and apparatus for depositing an organic compound layer having a plurality of function regions. A plurality of evaporation sources are provided within a deposition chamber. Function regions of respective organic compounds can be continuously formed and a mixed region be formed in an interface between the function regions. Meanwhile, a light source is provided in a deposition chamber to perform deposition while irradiating light to an anode surface, thereby forming a compact organic compound layer.
公开/授权文献
- US20020155632A1 Method and apparatus for film deposition 公开/授权日：2002-10-24