Invention Grant
- Patent Title: Fabrication method of a dynamic random access memory
- Patent Title (中): 动态随机存取存储器的制作方法
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Application No.: US11463896Application Date: 2006-08-11
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Publication No.: US07435643B2Publication Date: 2008-10-14
- Inventor: Ting-Shing Wang
- Applicant: Ting-Shing Wang
- Applicant Address: TW Hsinchu
- Assignee: ProMOS Technologies Inc.
- Current Assignee: ProMOS Technologies Inc.
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: H01L21/8242
- IPC: H01L21/8242

Abstract:
A dynamic random access memory (DRAM) cell is described, including a semiconductor pillar on a substrate, a capacitor on a lower portion of a sidewall of the pillar, and a vertical transistor on an upper portion of the sidewall of the pillar. The capacitor includes a first plate in the lower portion of the sidewall of the pillar, a second plate as an upper electrode at the periphery of the first plate, a third plate at the periphery of the second plate electrically connected with the first plate to form a lower electrode, and a dielectric layer separating the second plate from the first and third plates. A DRAM array based on the DRAM cell and a method for fabricating the DRAM array are also described.
Public/Granted literature
- US20070004130A1 FABRICATION METHOD OF A DYNAMIC RANDOM ACCESS MEMORY Public/Granted day:2007-01-04
Information query
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