发明授权
- 专利标题: Radio frequency signal processing device
- 专利标题(中): 射频信号处理装置
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申请号: US09707844申请日: 2000-11-08
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公开(公告)号: US07439621B1公开(公告)日: 2008-10-21
- 发明人: Hidetoshi Ishida , Kazuo Miyatsuji , Hidetoshi Furukawa , Tsuyoshi Tanaka , Daisuke Ueda
- 申请人: Hidetoshi Ishida , Kazuo Miyatsuji , Hidetoshi Furukawa , Tsuyoshi Tanaka , Daisuke Ueda
- 申请人地址: JP Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 主分类号: H01L23/34
- IPC分类号: H01L23/34 ; H01L23/552
摘要:
The RF device of the present invention includes: a semiconductor substrate; and first and second semiconductor components provided on the substrate. Each of the components includes source electrodes, a gate electrode and a drain electrode. And multiple through holes, which pass through the substrate in the thickness direction, are opened in a region of the substrate between the two components. To enhance the effect of suppressing electrical interference between the components, a gap between two adjacent ones of the through holes is preferably smaller than the thickness of the substrate.
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